Developing method and device therefor

Abstract

Abstract PURPOSE:To uniformly and accurately develop by forming a space with a pinner head in which a semiconductor substrate coated with a resist is evacuated in vacuum and a recessed container, introducing a developer thereinto, developing it, isolating the container from the head and rotating the head. CONSTITUTION:A semiconductor substrate 1 coated with a resist is evacuated in vacuum on a spinner head 2, a recessed container 3 is lowered by a piston mechanism 7, and a space is thus formed therebetween. Then, a developer 10 is introduced through a pipe 4, and the substrate is developed. Subsequently, the developer is exhausted, and a rinsing liquid 10' is then introduced through the pipe 4 to rinse it. Then the container is raised, the head 3 is rotated in high speed, and the rinsing liquid adhered onto the substrate 1 is removed. Since a complete dipping developing can be thus executed, a uniform and accurate patter development can be enabled, and the amount of the developer can be thus saved.

Inventors

• 👤 Kenzo Hatada

Bibliographic Details