Electron exposure device

Abstract

Abstract PURPOSE:To permit increase in send speed of a sample at low exposure density part by providing a speed adjusting means calculating a stage transit speed which is inversely proportional to exposure density. CONSTITUTION:An exposure sample 3 is provided on a sampling table 4. The sampling table 4 is continuously moved in an X-axis direction by a driving section 6 for moving the sampling table 4 and an objective section for exposure is exposed by a vector scan system while an electron beam is moved in a Y-axis direction within exposure width 31. When the electron beam reaches the end of the exposure sample by moving the sampling table in the X-axis direction, the sampling table 4 moves in the Y-axis direction by the exposure width 31. The driving speed of a driving section 6 in the X-axis direction is calculated by a speed adjusting means 8 based on the exposure data given by a calculator 9 for control. And the drive of the sampling table 4 is performed through a driving means 7 based on the calculated speed. Therefore, an exposure speed will be increased by moving the sampling table at a speed which is inversely proportional to the exposure density.

Inventors

• 👤 Takeari Uema

Bibliographic Details