Alignment stage for step and repeat exposure

Abstract

Abstract PURPOSE: To move a wafer at a high speed with high precision and also to position accurately a mask at a position where the wafer opposes by a wafer moving mechanism freely from mechanical friction and a fine-moving mechanism that makes fine adjustments of the position and direction of a mask pattern. CONSTITUTION: Mutual intervals between traveling table 2 on which wafer 3 is mounted, and traveling body 4 which moves traveling table 2 back and forth and forth and traveling body 5 which moves traveling table 2 right and left are held by a static-pressure air bearing without any friction at all and traveling table 2 is held on surface plate 1 by the static-pressure air bearing on the reverse surface without contact. Further, internals between guides 6 guiding traveling bodies 4 and 5 and respective traveling bodies also constitute the static-pressure air bearing and each traveling body is driven by a linear motor without mechanical contact. Inside of mask holder 10 supported at a fixed position on surface plate 1, X and Y fine- moving mechanisms, Z fine-moving mechanism and θ fine-moving mechanism are provided, so that the position and direction of mask 9 can finely be adjusted. COPYRIGHT: (C)1981,JPO&Japio

Inventors

• 👤 Hiroo Kinoshita
• 👤 Munenori Kanai
• 👤 Tadao Saito
• 👤 Kazue Yoshida
• 👤 Shinichi Yamazaki

Bibliographic Details