Manufacture of semiconductor device

Abstract

Abstract PURPOSE:To prevent breakage of wiring, by providing an opening of a glass membrane with an insulating membrane having a good affinity with glass and then providing it with glass flow. CONSTITUTION:After forming a prescribed dispersion layer on an Si substrate and providing it with an electrode window, a PSG 8 which has the same chemical composition as a covered PSG7 is laminated for insulation. When glass flow is provided as the thin membrane of PSG8 is formed on surface of Si in the electrode window area, the window is allowed to form smooth shapes of B and C by surface tensions of the thick membrane 7 and the thin membrane 8. By providing an Al wiring 9 with an opening, the wiring becomes able to be prevented from breakage.

Inventors

• 👤 Atsushi Nakano
• 👤 Shinpei Tanaka

Bibliographic Details