Dimension measuring device

Abstract

Abstract PURPOSE: To measure even the width of oblique pattern exactly and easily by turning the clear stage by the inclination angle of the pattern in the pattern dimension measuring device for the printed plate mask. CONSTITUTION: The Y-axis stage 3 on the base 2 and the X-axis stage 4 on the Y-axis stage 3 can freely be slided in the direction of Y-axis and X-axis respectively, the clear stage 14 can freely be rotated on the X-axis stage. When the pattern 21 of the mask 20 set on the clear stage 14 is inclined by θ 2 degrees to the Y-axis, the angle θ 2 is inputted to the rotation angle input terminal 18 and the clear stage 14 is turned through θ 2 degrees in the direction of the arrow A to make the pattern edge parallel to the Y-axis. Next the mask 20 is moved in the direction of X-axis by the X-axis stage driving pulse motor 11. Since the light projected from the lamp 5 to the photo-electric conversion element 6 is cut off only while the pattern 21 crosses the optical axis when the mask 20 is moved, the pattern width can exactly be measured by the extent of light modulation although the pattern width is obliquely staggered. COPYRIGHT: (C)1980,JPO&Japio

Inventors

• 👤 Tadao Nakakuki

Bibliographic Details