High reflecting back face mirror of plastic substrate

Abstract

Abstract PURPOSE: To enable the titanium dioxide thin film of high refractive index directric to be formed on a plastic systrate by flying titanium of its oxide toward the substrate while radiating oxygen ion beams thereto without sybjecting the substrate to high- temperature heating. CONSTITUTION: A plastic substrate 4 is held by a dome 5 and the electron beams 8 generating from an electron gun 6 being an evaporating source collide against TiO7 and MgF 2 being evaporating meterials to let these evaporate. At the same time, a resistance heater 9 heats Al10 to let the same evaporate. In forming the TiO 2 film, the oxygen gas from an oxygen gas source 2 is ionized by a cold cathode type ion source 3 and the oxygen ion beams are radiated to the substrate 4. At the same time TiO is evaporated by the electron beams 8, by which the TiO 2 film is caused to make reaction evaporation. Thereafter, vapor deposition of MgF 2 and vapor deposition forming of Al reflecting film are subsequently accomplished, whereby the high- reflection back face mirror is obtained. COPYRIGHT: (C)1980,JPO&Japio

Inventors

• 👤 Tatsuhiko Sawaguchi

Bibliographic Details