Patent JPS5564233A successfully refreshed from Google Patents.
JPS5564233A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Peeling solution for positive type photoresist
Assignee: Fujitsu Ltd
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Filing: 1978-11-07
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Granted: —
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Expires: 1998-11-07
Abstract
Abstract PURPOSE:To form the peeling solution for positive type photoresist which is usable at room temperature by mixing the specific chlorinated aliphatic hydrocarbons and alkanol. CONSTITUTION:The peeling solution comprising mixing one or more kinds of 1, 1,1-trichloro-ethane, trichloro-ethylene, tetra chloro-ethylene; 30-90vol% and methanol, ethanol, n-(i) propanol, n-(i) butanol; 10-70vol% is prepared. The abovementioned peeling solution well dissolves the positive type photoresist, has no inflammability and corrosiveness and is low in toxicity.
Inventors
- 👤 Hideki Fujiwara
- 👤 Akira Hirano
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-08 06:11
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; G03F7/422; G03F7/426
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