Fabricating method for thin-film magnetic head

Abstract

Abstract PURPOSE: To make it possible to obtain excellent characteristics by attaining fine work by reducing a taper part in absolute value by processing a back core part by chemical etching. CONSTITUTION: On substrate 1, lower magnetic film 2, lower insulating film 3 and conductor film 4 are formed. After photo resist 8 is applied, a pattern on photo resist and layer 3 is formed by exposing, developing and etching through a mask to form selective plating layer 9 on film 2 of the exposed back-core part thicker to a thickness greater than the height of resist 8. Then, resist 8 is removed and layer 9 is shaped in a mushroom. After upper insulating film 5 is formed on the entire surface, only layer 9 is removed and a window is made in films 5 and 3. Next, an upper magnetic film of a fixed thickness is provided and an effective closed magnetic path is formed at the back core part. COPYRIGHT: (C)1980,JPO&Japio

Inventors

• 👤 Toru Kira
• 👤 Masaya Hijikigawa

Bibliographic Details