Cleaning device for semiconductor wafer

Abstract

Abstract PURPOSE: To remove stains reliably and speedily by providing a rocking and rotating spray nozzle means on a turntable mounting a semiconductor wafer and spraying jet sprayed flow from this means to the wafer. CONSTITUTION: A wafer 2 after dicing and attached on thin film is mounted on a turn table 6 and suctioned by a vacuum pipe 10 and a spray nozzle means 12 in which pressure air or nitrogen is entered through a solenoid valve 24 in one side and water flow is entered also through a solenoid valve 26 in other side is disposed on the wafer. A supporting shaft 14 of this means 12 is rockably constructed by a ball 18 and a deviation cam 20 on a roll bearing 16 and a motor 22 for this shaft and a motor 4 for turn table 6 are reversely rotated each other. Thus, these relative rotations are highly speeded and jet flow is sprayed from the nozzle 12 to the wafer 2 to clean. COPYRIGHT: (C)1980,JPO&Japio

Inventors

• 👤 Katsumi Shibasawa

Bibliographic Details