Semiconductor cleansing method

Abstract

Abstract PURPOSE: To dissolve the uneven cleansing for the stage error surface of many projection parts provided on the substrate surface when cleansing the substrate surface by jetting out the cleansing solution and also turning the substrate, by repeating at least more than once the forward and backward rotations alternately during the solution jetting. CONSTITUTION: Spin head 2 onto which semiconductor substrate 3 is put is driven by motor 1 capable of the forward and backward rotations. In other words, heas 2 is rotated forward and backward with a predetermined revolution angle, and cleansing solution jet current 7 is prayed onto substrate 3 through nozzle 6 provided at the upper part. In such way, stage error part 9 and 10 at the both sides of projection part 8 provided on substrate 3 are exposed into current 7 alternately, thus ensuring a uniform cleansing. Thus, the uneven cleansing never occures on substrate 3, enhancing the products yield COPYRIGHT: (C)1979,JPO&Japio

Inventors

• 👤 Akira Watanabe

Bibliographic Details