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JPS5521184A Expired / Lapsed JP ⏱️ 0.0 years remaining

Method of manufacturing schottky barrier-gate type electric field effect transistor

Assignee: Mitsubishi Electric Corp
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Filing: 1978-08-03
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Granted: —
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Expires: 1998-08-03
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Abstract

Abstract PURPOSE:To eliminate short-circuit when wiring a lead wire and to improve the production yield by making a lead wire wiring electrode of salient electrode structure and by arranging it higher than a base surface. CONSTITUTION:To form an active layer 3 on an semiinsulating Ga-As base 2 and an insular source electrode 4 as well as a gate electrode having a Schottoky contact with a drain electrode and the active layer 3. To form a salient electrode 13 facing a source electrode 4 through a metallic contact. By doing so, there is no danger that the source lead wire will contact the drain electrode as well as the gate electrode.

Inventors

  • 👤 Michihiro Kobiki
  • 👤 Shigeru Mitsui
  • 👤 Manabu Watase
  • 👤 Masaaki Nakatani
  • 👤 Saburo Takamiya

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-10-27 05:01
CPC Classifications
H; H10; H10W; H10W72/00; H10W72/01; H10W72/019; H10W72/90; H10W72/071; H10W72/075; H10W72/07551; H10W72/50; H10W72/531; H10W72/5363; H10W72/541; H10W72/5453; H10W72/59; H10W72/931; H10W72/932

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