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JPS55136124A Expired / Lapsed JP ⏱️ 0.0 years remaining

Manufacture of zinc oxide film

Assignee: Seiko Instruments Inc
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Filing: 1979-04-09
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Granted: —
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Expires: 1999-04-09
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Abstract

Abstract PURPOSE: To enable easy formation of the second sputtering film with high adherence by closely contacting a metallic material to the surface of a jig in the first sputtering when zinc oxide films are formed on two sides of the material. CONSTITUTION: In the first sputtering of metallic material 6, by applying a press. one side to be subjected to the second sputtering is closely contacted to jig 10 to make airtightness. By this method zinc oxide films can easily be formed on two sides of material 6 by repeating sputtering twice, and a piezoelectric oscilltor having superior electrical performance, or the lke can be manufactured. COPYRIGHT: (C)1980,JPO&Japio

Inventors

  • 👤 Tsuneo Yamazaki

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-09 06:04
CPC Classifications
—

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