Location mark for electron beam exposure

Abstract

Abstract PURPOSE: To obtain location mark for electron beam exposure by forming at least two or more V-shaped grooves on a silicone base plate, and by controlling the length of the convex flat part between the adjacent V-shaped grooves. CONSTITUTION: On a silicone base plate 111 with a plane azimuth of (100) are formed two V-shaped grooves formed by anisotropic etching to have a plane azimuth (111) on the wall surface. The length of the convex flat part 151 between the adjacent V-shaped grooves is to be 4.0μm or more to obtain a location mark 112 for electron beam exposure. COPYRIGHT: (C)1980,JPO&Japio

Inventors

• 👤 Hisaaki Aizaki

Bibliographic Details