Patent JPS5378170A successfully refreshed from Google Patents.
JPS5378170A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Continuous processor for gas plasma etching
Assignee: Toshiba Corp
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Filing: 1976-12-22
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Granted: —
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Expires: 1996-12-22
Abstract
Abstract PURPOSE: To achieve the continuous and automatic gas plasma process of a processed material by providing a plasma generating part and processing part to different parts respectively. COPYRIGHT: (C)1978,JPO&Japio
Inventors
- 👤 Shinichi Yamamoto
- 👤 Yasuhiro Sumitomo
- 👤 Yasuhiro Horiike
- 👤 Masahiro Shibagaki
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-08 10:39
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/30; H10P72/33; H10P72/3306; B; B23; B23K; B23K28/00; H10P72/04; H10P72/0402; H10P72/0418; H10P72/0421; H10P72/3311
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