Patent JPS5366376A successfully refreshed from Google Patents.
JPS5366376A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Photo mask
Assignee: Fujitsu Ltd
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Filing: 1976-11-26
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Granted: —
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Expires: 1996-11-26
Abstract
Abstract PURPOSE: To avoid the residual air at the center of contact surface and to avoid difficulty in separation due to excessive adhesion, by covering the pattern surface of photo mask with the resin film having fine surface unevenness. COPYRIGHT: (C)1978,JPO&Japio
Inventors
- 👤 Takashi Ariga
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-10-24 10:15
CPC Classifications
—
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
JPS49131681A
Cited
JPS5179575A
Cited
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