Patent US3627129A successfully refreshed from Google Patents.
Patent JPS5339075A successfully refreshed from Google Patents.
JPS5339075A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Step and repeat exposure method of masks
Assignee: Hitachi Ltd
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Filing: 1976-09-22
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Granted: —
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Expires: 1996-09-22
Abstract
Abstract PURPOSE: To enhance mask alignment accuracy and improve workability by beforehand putting plural kinds of patterns within a single original plate, covering the patterns which are required for the moment out of these patterns and exposing only the reguired patterns. COPYRIGHT: (C)1978,JPO&Japio
Inventors
- 👤 Morihisa Hoko
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-08 01:04
CPC Classifications
—
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