Patent EP0687925A2 successfully refreshed from Google Patents.
Patent JPS5330280A successfully refreshed from Google Patents.
JPS5330280A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Electron beam exposure apparatus
Assignee: Fujitsu Ltd
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Filing: 1976-09-01
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Granted: —
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Expires: 1996-09-01
Abstract
Abstract PURPOSE: To obtain exposure patterns of high accuracy with a simple focussing constitution by radiating the final square electron beam to a metal reticle of a corresponding size and detecting the influent current change when deflection is applied and feeding said change back to an electron lens. COPYRIGHT: (C)1978,JPO&Japio
Inventors
- 👤 Yasutaka Ban
- 👤 Hiroshi Yasuda
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-09 07:56
CPC Classifications
—
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