Patent JPS5314570A successfully refreshed from Google Patents.
JPS5314570A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Production of photo mask
Assignee: NTT Inc
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Filing: 1976-07-26
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Granted: —
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Expires: 1996-07-26
Abstract
Abstract PURPOSE: To produce two kinds of photo masks reverse of light and darkness by using one kind of resist. COPYRIGHT: (C)1978,JPO&Japio
Inventors
- 👤 Nobuo Tsuda
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-06 12:34
CPC Classifications
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