Patent JPS5295581A successfully refreshed from Google Patents.
JPS5295581A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Sputiering apparatus
Assignee: Canon Anelva Corp
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Filing: 1976-02-09
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Granted: —
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Expires: 1996-02-09
Abstract
Abstract PURPOSE:To economically let consume the target by giving shock with ion on the furface of the target uniformly and to make uniform the distribution of sputtering film thickness on the base plate holder, by varying the relative position of the target and the magnetic field near the taret with times in vacuum vessel.
Inventors
- 👤 Takashi Misumi
- 👤 Naokichi Hosokawa
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-08 03:17
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3402; H01J37/3405; H01J37/3408
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
JPS5186083A
Cited
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