Patent JPS5277686A successfully refreshed from Google Patents.
JPS5277686A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Manufacture of semiconductor diaphragm
Assignee: Denso Corp
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Filing: 1975-12-24
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Granted: —
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Expires: 1995-12-24
Abstract
Abstract PURPOSE: To get precisely the parallelism and the thickness of the pressure-sensitive part by easily setting ion implantation and epitaxial layers by setting stp layer which is resistant against etching solution in semiconductor substrate and automatically stopping the etching. COPYRIGHT: (C)1977,JPO&Japio
Inventors
- 👤 Tetsuo Fujii
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-10-26 06:03
CPC Classifications
—
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