Patent JPS5222479A successfully refreshed from Google Patents.
JPS5222479A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Method of inspecting masks
Assignee: Fujitsu Ltd
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Filing: 1975-08-13
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Granted: —
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Expires: 1995-08-13
Abstract
Abstract PURPOSE: To solve the troublesomeness of alignments and to shorten the inspection time by performing the comparison inspection of various types of photo masks being measured with the use of one standard mask. COPYRIGHT: (C)1977,JPO&Japio
Inventors
- 👤 Tsunehiro Naganami
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-09 12:57
CPC Classifications
—
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