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JPS522174A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Self-matching etching process
Assignee: Hitachi Ltd
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Filing: 1975-06-13
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Granted: —
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Expires: 1995-06-13
Abstract
Abstract PURPOSE: To provide self-matching etching process which does not require mast matching at all by utilizing COD method. COPYRIGHT: (C)1977,JPO&Japio
Inventors
- 👤 Hideo Sunami
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-10-29 22:50
CPC Classifications
—
Claims Analysis
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References Cited (Backward Citations)
JPS4917973A
Cited
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