Patent JPS522164A successfully refreshed from Google Patents.
JPS522164A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Wafer cleaning and drying device
Assignee: Hitachi Ltd
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Filing: 1975-06-24
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Granted: —
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Expires: 1995-06-24
Abstract
Abstract PURPOSE: To prevent vortex to enable clean cleaning and drying by providing ceiling plate on top of a wafer container of a wafer cleaning and drying device. COPYRIGHT: (C)1977,JPO&Japio
Inventors
- 👤 Hiroto Nagatomo
- 👤 Ryoichi Okuda
- 👤 Hisao Seki
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-03 17:19
CPC Classifications
—
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