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JPH11219902A Expired / Lapsed JP ⏱️ 0.0 years remaining

Exposure apparatus and device manufacturing apparatus

Assignee: Nikon Corp
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Filing: 1998-11-16
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Granted: —
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Expires: 2018-11-16
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Abstract

Abstract Translated from Japanese (57)【要約】 【課題】 露光光の光路の少なくとも一部に高透過率 (不活性)で熱伝導率が良好な気体を供給する場合に、 その気体の使用量を抑制する。 【解決手段】 床F1上の環境チャンバ7内に露光本体 部26が設置され、外部のF 2 レーザ光源3を収納する カバー1から環境チャンバ7の内側までの照明光学系の 大部分がサブチャンバ6で覆われている。階下の床F2 上の所定のボンベ内の高純度のヘリウムガスを配管31 を介してサブチャンバ6、及び露光本体部26の投影光 学系PL内に供給し、環境チャンバ7の天井近傍に集ま るヘリウムガスと、主に窒素よりなる空気の成分との混 合気体を配管33を介して階下の集塵排水装置35に導 き、集塵排水装置35を通過した混合気体を冷凍装置3 7に通して液化した空気の成分を所定のボンベに回収 し、気体のままのヘリウムを配管41、混合温調装置、 及び配管31を介して再循環させる。 (57) [Problem] To supply a gas having a high transmittance (inert) and a good thermal conductivity to at least a part of an optical path of exposure light, Use less gas. SOLUTION: An exposure main body part 26 is installed in an environment chamber 7 on a floor F1, and most of an illumination optical system from a cover 1 accommodating an external F 2 laser light source 3 to an inside of the environment chamber 7 is a sub-chamber. 6 is covered. Downstairs floor F2 High-purity helium gas in the predetermined cylinder Through the pipe 33 through the sub-chamber 6 and the projection optical system PL of the exposure main body 26 via the helium gas collected near the ceiling of the environment chamber 7 and an air component mainly composed of nitrogen. Via the dust collecting and draining device 35 through the dust collecting and draining device 35 downstairs. The liquefied air component passed through 7 is collected in a predetermined cylinder, and helium in a gaseous state is passed through a pipe 41, a mixing temperature controller, And recirculate through the pipe 31.

Inventors

  • 👤 Nobutaka Umagome
  • 👤 伸貴 馬込

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-10-31 23:20
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70058

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