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Dielectric thin film element

Assignee: Olympus Corp
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Filing: 1995-07-28
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Granted: —
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Expires: 2015-07-28
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Abstract

Abstract Translated from Japanese (57)【要約】 【課題】絶縁耐圧、耐疲労特性、誘電率が低いこと。 【解決手段】基板(51)上に形成された下部電極(54)と、 前記下部電極(54)上に形成された高、強誘電体膜(55) と、前記高、強誘電体膜(55)上に形成された上部電極(5 6)とを有する誘電体薄膜素子において、前記下部電極(5 4)がRh、Ru、Os、Irのうち少なくとも一種の元 素を含有するPtからなることを特徴とする誘電体薄膜 素子。 (57) 【Abstract】 PROBLEM TO BE SOLVED: Low dielectric strength, fatigue resistance and dielectric constant. A lower electrode (54) formed on a substrate (51), A high ferroelectric film (55) formed on the lower electrode (54) And the upper electrode (5) formed on the high ferroelectric film (55). In the dielectric thin film element having (6), the lower electrode (5 4) A dielectric thin film element characterized by comprising Pt containing at least one element selected from Rh, Ru, Os and Ir.

Inventors

  • 👤 Yoshiki Kuroda
  • 👤 吉己 黒田
  • 👤 Takashi Mihara
  • 👤 孝士 三原

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-09 05:22
CPC Classifications
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