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Manufacture of light molded form and device therefor

Assignee: Asahi Chemical Industry Co Ltd
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Filing: 1992-08-06
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Granted: —
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Expires: 2012-08-06
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Abstract

Abstract Translated from Japanese (57)【要約】 【目的】 デザインに忠実で寸法精度が良く気泡の混入 が極めて少ない高品質な光造形物を短時間で効率良く製 造できる光造形物の製造方法及びその装置をうることを 目的とするものである。 【構成】 液状感光性樹脂液中に昇降可能な成型架台を 設け、その上方に薄い樹脂層を形成するように樹脂液中 に浸透し、当該感光性樹脂液の自由表面に活性光線を選 択照射して光硬化層を形成し、次に成型架台を一定距離 だけ感光樹脂表面より降下させ光硬化層上面に新たな液 状感光性樹脂を供給し、再び感光性樹脂液面に活性光線 を選択照射して次光硬化層を形成する操作を繰り返して 成型架台上に複数の光硬化層を積み重ね形成して所望の 光造形物を製造できるものであって容器とドクターブレ ードからなる樹脂供給機構を浴槽の一端から他端まで移 動させることにより光硬化樹脂層上面に一様一定厚の樹 脂層を形成するものである。 (57) [Abstract] [Purpose] To obtain a manufacturing method of a stereolithography product and a device therefor capable of efficiently manufacturing a high-quality stereolithography product that is faithful to the design, has good dimensional accuracy, and has extremely few air bubbles. It is intended. [Structure] A molding frame that can be moved up and down is provided in the liquid photosensitive resin liquid, and penetrates into the resin liquid so as to form a thin resin layer above it, and the active surface is selectively irradiated to the free surface of the photosensitive resin liquid. To form a photo-curing layer, then lower the molding frame by a certain distance from the surface of the photosensitive resin to supply new liquid photosensitive resin to the upper surface of the photo-curing layer, and then selectively irradiate the photosensitive resin liquid surface with actinic rays. Then, the operation of forming the next photocurable layer is repeated to form a plurality of photocurable layers on the molding stand to form a desired stereolithography object, and a resin supply mechanism including a container and a doctor blade is used as a bath. The resin layer having a uniform thickness is formed on the upper surface of the photocurable resin layer by moving the resin layer from one end to the other end.

Inventors

  • 👤 Mikichi Watanabe
  • 👤 巳吉 渡辺
  • 👤 Kazuhiro Mori
  • 👤 千寛 森
  • 👤 Masaru Yanagida
  • 👤 優 柳田

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-08 22:19
CPC Classifications
B; B29; B29C; B29C41/00; B29C41/02; B29C41/12; B29C64/00; B29C64/10; B29C64/106; B29C64/124; B29C64/129; B29C64/135; B29C35/00; B29C35/02; B29C35/08; B29C35/0805; B29K; B29K2995/00; B29K2995/0037; B29K2995/0072; B29K2995/0073

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