Phase shift mask and its production

Abstract

Abstract Translated from Japanese (57)【要約】 【目的】 製造工程時においてガラス基板および位相シ フタに欠陥等の入らない位相シフタマスクおよびその製 造方法を提供する。 【構成】 遮光膜２の上に、この遮光膜２の膜厚との合 計が露光光の位相を反転させるに必要な膜厚となる補助 膜３が隣接する補助膜３との間隔が１つ置きに広くなる ように設けられている。これにより、ガラス基板１表面 全面に形成される透明膜４には、補助膜３が広く設定さ れた領域において、その深さが遮光膜２と補助膜３の膜 厚との和に等しい凹部５が自己整合的に形成される。 (57) [Summary] [Object] To provide a phase shifter mask in which defects and the like do not enter the glass substrate and the phase shifter during the manufacturing process, and a manufacturing method thereof. [Structure] On the light-shielding film 2, there is one gap between the auxiliary film 3 and an auxiliary film 3 adjacent to the auxiliary film 3 whose total thickness together with the film thickness of the light-shielding film 2 is necessary to invert the phase of exposure light. It is provided so that it is wide for the rest. As a result, in the transparent film 4 formed on the entire surface of the glass substrate 1, in the region where the auxiliary film 3 is set wide, the depth thereof is equal to the sum of the film thicknesses of the light shielding film 2 and the auxiliary film 3. Are formed in a self-aligned manner.

Inventors

• 👤 Kinya Kamiyama
• 👤 欣也 上山
• 👤 Shuichi Matsuda
• 👤 修一 松田

Bibliographic Details