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JPH0613701A Expired / Lapsed JP ⏱️ 0.0 years remaining

Semiconductor laser manufacturing method

Assignee: Fujitsu Ltd
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Filing: 1992-06-25
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Granted: —
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Expires: 2012-06-25
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Abstract

Abstract Translated from Japanese (57)【要約】 【目的】 DFB レーザに関し,光CATVシステムにおける 光源に適用可能な低歪みかつ高出力の特性を得るために コルゲーションの光結合効率を向上することを目的とす る。 【構成】 光活性層等の半導体層を成長させる工程また はその前処理工程において高温雰囲気に曝されることに よる変形を考慮して, 基板上にあらかじめ形成するコル ゲーションを, 平坦で有限の幅を有する凹部と, この凹 部より幅の狭い凸部とを交互に繰り返して構成する。 (57) [Summary] [Objective] Regarding the DFB laser, the purpose is to improve the optical coupling efficiency of corrugation in order to obtain the characteristics of low distortion and high output applicable to the light source in the optical CATV system. [Constitution] In consideration of deformation caused by exposure to a high temperature atmosphere in the step of growing a semiconductor layer such as a photoactive layer or the pretreatment step thereof, the corrugation formed in advance on the substrate has a flat and finite width. The concave portions and the convex portions narrower than the concave portions are alternately repeated.

Inventors

  • 👤 Ichiro Ushijima
  • 👤 一郎 牛嶋
  • 👤 Osamu Obara
  • 👤 治 小原

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-04 13:12
CPC Classifications
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