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JPH0479345A Expired / Lapsed JP ⏱️ 0.0 years remaining

Device and method for analyzing semiconductor device

Assignee: Fujitsu Ltd
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Filing: 1990-07-23
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Granted: —
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Expires: 2010-07-23
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Abstract

Abstract PURPOSE:To specify the defective part of a semiconductor device which has a dynamic defect in short time with excellent reproducibility by processing light emitting phenomenon by simultaneously processing the impressing timing of a dynamic voltage VD with the obtaining timing of the light emitting phenomenon. CONSTITUTION:The device is provided with at least an image process control system 23 which simultaneously control and process the impressing timing of a dynamic voltage VD2 with the obtaining timing of a light emitting image based on a reference clock DLK. Therefore, when the dynamic voltage VD2 is impressed on a sample 26, which caused a defect, by a dynamic voltage generating device 21 based on the reference clock CLK, light emitting phenomenon from a defective part is generated by satisfying the presence conditions of the defective part and the conditions for impressing the dynamic voltage V2 to the sample 26 which has the defective part. Thus, the light emitting image of the defective part which caused the dynamic defect is obtained by simultaneously controlling and processing the impressing timing of the dynamic voltage VD2 with the obtaining timing of the light emitting phenomenon based on the reference clock CLK.

Inventors

  • 👤 Koji Nanba
  • 👤 浩司 難波
  • 👤 Osamu Ishii
  • 👤 理 石井

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-06 13:34
CPC Classifications
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