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JPH0465415A Expired / Lapsed JP ⏱️ 0.0 years remaining

Production of novolak resin having decreased inpurity metal content

Assignee: Resonac Corp
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Filing: 1990-07-04
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Granted: —
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Expires: 2010-07-04
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Abstract

Abstract PURPOSE:To obtain the subject novolak resin useful as a photo-resist solution or a leveling agent by using a synthetic raw material having decreased impurity metal content and synthesizing the resin in a specific reactor while introducing an inert gas into the reactor. CONSTITUTION:The objective novolak resin is produced by purifying phenols and aldehydes used as synthetic raw materials for novolak resin by distillation or ion exchange resin treatment to decrease the impurity metal content. The obtained synthetic raw materials having decreased impurity metal content are charged to a synthetic reactor free from dissolution of impurity metal component (e.g. quartz reactor and acid-washed glass reactor) and reacted while introducing 0.5-1.5l/min of an inert gas such as nitrogen or argon into the reactor to obtain the objective novolak resin.

Inventors

  • 👤 Koji Kato
  • 👤 幸治 加藤
  • 👤 ▲コイ▼渕 滋
  • 👤 Shigeru Koibuchi
  • 👤 Asao Isobe
  • 👤 磯部 麻郎

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-10-31 16:27
CPC Classifications
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