Semiconductor manufacturing equipment

Abstract

Abstract PURPOSE:To prevent the evaporation of volatile solvent in coating liquid, and keep the viscosity of the coating liquid constant, by making nitrogen gas flow in the solvent atmosphere of coating liquid, mixing the gas with the saturation vapor of the solvent, introducing said gas into a coating liquid vessel for spin coating, and accommodating the coating liquid in the saturation vapor atmosphere of the solvent. CONSTITUTION:When pressurized nitrogen gas supplied from a wipe 201 passes a solvent vessel 203, said gas is sent out to a sending pipe 202, in the state containing the vapor of highly volatile solvent. The closed vessel 203 containing the solvent vapor is controlled at a temperature slightly higher than the normal temperature by using a heater 204, and the vapor generation of the solvent 205 is accelerated. The pressurized nitrogen gas containing the solvent vapor is cooled while it passes a trap 206, and forms the saturation state of solvent vapor. The pressurized nitrogen gas 208 containing the solvent vapor formed in the above manner is introduced in a closed coating liquid vessel 212. Thereby the quantity of solvent can be controlled to be always constant during coating period.

Inventors

• 👤 Masaki Watanabe
• 👤 正樹 渡邉

Bibliographic Details