Plasma reactor

Abstract

Abstract PURPOSE:To reduce plasma damage to the process subject by disposing an overlapping structure of cylindrical inner electrodes in which a plurality of cylindrical inner electrodes are placed inside a cylindrical reactor so that the small holes of each do not actually overlap. CONSTITUTION:The system consists of a cylindrical reactor container 5 with a gas inlet pipe 1 and exhaust pipe 2 connected to a vacuum system, outer electrodes 3 densely placed on the periphery of the reaction container 5, and cylindrical inner electrodes 4 with many small holes on the inner walls which are placed on the same axis inside the reactor container 5 and at the same spacing as the outer electrodes. Then, a plurality of inner electrodes 4 are placed inside the reactor container 5 in an overlapping structure so that the holes of each do not actually overlap. As a result, the plasma ions which enter the plasma processing region are effectively caught and the ultraviolet rays produced from the glow discharge region are effectively blocked. This enables a reduction in the plasma damage to the process subject.

Inventors

• 👤 Shigekazu Takashima
• 👤 高島　重和

Bibliographic Details