High-polymer liquid crystal composite and production thereof

Abstract

Abstract PURPOSE:To easily allow writing of patterns without impression of electric fields by writing the patterns while utilizing the phase sepn. and change of a liquid crystal which arise according to the polymn. conditions of a high-polymer matrix. CONSTITUTION:The writing of the patterns is executed by utilizing the phase sepn. and change of the liquid crystal which arise according to the polymn. conditions, such as temp. and light intensity, of the high-polymer matrix. Namely, a soln. mixture 30 contg. the high-polymer MA of a polymer or oligomer and the liquid crystal molecules MB is held between supports 32 and 34 and a light shielding mask 36 is formed on the base 32. The soln. mixture 30 is set at such a temp. at which the soln. mixture is maintained at the temp. below the nematic to isotropic transition point of the liquid crystal. The soln. mixture is then irradiated with light which causes a polymn. reaction, for example, UV rays. The polymn. reaction is effected in the part irradiated with the UV rays. The liquid crystal drops MC are then separated in phase and are formed in the high-polymer matrix. The soln. mixture 30 is then set at the temp. higher than the temp. in the process of the previous stage and is irradiated with the light over the entire part, by which the polymn. is effected. The patterns are easily written when the electric fields are not impressed to the soln. in such a manner.

Inventors

• 👤 Shigeo Shimizu
• 👤 滋雄 清水
• 👤 Takehisa Asami
• 👤 剛尚 浅見

Bibliographic Details