Production of thin film of lithium niobate single crystal

Abstract

Abstract PURPOSE:To obtain the thin film of a lithium niobate single crystal having the film thickness adequate for a thin-film waveguide type SHG element, etc., by bringing a lithium tantalate substrate into contact with a melt of a specific compsn. and epitaxially growing the lithium niobate. CONSTITUTION:The lithium tantalate substrate is brought into contact with the melt which consists mainly of Li2O, V2O5, Nb2O5, Na2O, and MgO, has the compsn. range of the Li2O, V2O5 and Nb2O5 within the region enclosed by the 4 compsn. points of A (88.90, 2.22, 8.88), B(55.0, 43.0, 2.00), C(46.5, 51.5, 2.00), D(37.50, 5.00, 57.50) in a triangular diagram and contains the Na2O at Na2O/LiO2=2.0/98.0 to 93.5/6.5 by molar ratio and the MgO at MgO/lithium niobate=0.1/99.9 to 25.0/75.0 by molar ratio. The thin film of the lithium niobate single crystal is then epitaxially grown on the (0001) face of the lithium tantalate by matching the lattice constants of the a-axis at 600 to 1,250 deg.C.

Inventors

• 👤 Masaya Yamada
• 👤 雅哉 山田
• 👤 Tetsushi Ono
• 👤 哲史 大野
• 👤 Akira Enomoto
• 👤 亮 榎本

Bibliographic Details