Second higher harmonics generating element and production thereof

Abstract

Abstract PURPOSE:To improve the efficiency of the generation of second harmonic wave light by specifying the ordinary light refractive index of substrate and a thin- film waveguide layer to a basic laser beam, the extraordinary light refractive index to the second higher harmonics and the thickness of the thin-film waveguide layer. CONSTITUTION:The thin-film waveguide layer is formed on the substrate in such a manner that the wavelength (lambdamum) of laser beam of the basic wave, the film thickness (Tmum) of the thin-film waveguide layer, the ordinary light refractive index (nOS1) of the substrate at the wavelength of the basic wave laser beam, the ordinary light refractive index (nOF1) of the thin-film waveguide layer, the extraordinary light refractive index (nQS2) of the substrate at the wavelength of the second higher harmonics, and the extraordinary light refractive index (nQF2) of the thin-film waveguide layer satisfy equation I or equation II. In the equation I, N1 is expressed by equation III. In the equation II, N2 is expressed by equation IV. The second higher harmonics is extremely efficiently generated in this way.

Inventors

• 👤 Akira Enomoto
• 👤 亮 榎本
• 👤 Masaya Yamada
• 👤 雅哉 山田

Bibliographic Details