Production of antireflection film

Abstract

Abstract PURPOSE:To improve the adhesive strength of an antireflection layer to a high-polymer substrate by subjecting the surface of the substrate to an oxygen plasma treatment prior to formation of the antireflection layer. CONSTITUTION:The atmosphere pressure in a vacuum vessel 1 is evacuated to <=10<-4>Torr by a vacuum pump and thereafter, oxygen is introduced into the chamber by opening a valve 3. The atmosphere pressure of the vessel is regulated to 1X10<-3> to 9X10<-3>Torr suitable for the treatment. Oxygen plasma is generated on the surface of the high-polymer substrate 14 on a electrode 5 when a high-frequency voltage is impressed to the electrode 5 by a power source 6. The surface of the substrate 14 is treated and chemically activated by this plasma. The treatment quantity is characteristic adjusted to 0.2 to 10Watt.sec/cm<2> in order to improve the adhesive strength of the treated surface of the substrate and the antireflection layer formed on the treated surface. The antireflection layer is then formed on the oxygen plasma treated surface of the high-polymer substrate. The formation of the antireflection layer is executed in the same manner as heretofore. The high adhesive strength of the antireflection layer to the substrate is obtd. in this way even if the temp. at which the antireflection layer is formed to the surface of the high-polymer substrate is relatively low (for example, <=100 deg.C).

Inventors

• 👤 Yasuhito Owaki
• 👤 泰人 大脇
• 👤 Shige Hashimoto
• 👤 樹 橋本
• 👤 Tsukasa Miyazaki
• 👤 司 宮崎

Bibliographic Details