Formation of multicolor pattern for color filter

Abstract

Abstract PURPOSE:To allow uniform coating without unequalness by using the soln. of a pigment-dispersed photosensitive compsn. contg. organopolysiloxane compds. and/or fluorine surfactants for forming 2nd and subsequent colored patterns on the surface of a substrate on which 1st patterns are formed. CONSTITUTION:The soln. of the stage of subjecting a coating layer to exposing through mask patterns and developing the exposed coating layer to form color patterns 5, 6 on the transparent substrate is so prepd. as to contain a negative type photoresist compsn., pigment, org. solvent, and at least one kind of the organopolysiloxane compds. and/or the fluorine surfactants. The generation of a spacing from the 1st patterns 5 is, therefore, prevented in the method of coating a 2nd photosensitive liquid 61 on the substrate 2 having steps on the surface formed with the 1st patterns 5. In addition, the generation of ruggedness on the contact surface with the 1st patterns 5 is prevented. The coated film free from the unequal thickness of the film is obtd. in such a manner.

Inventors

• 👤 Kesanao Kobayashi
• 👤 小林　袈裟直

Bibliographic Details