Formation of pattern for measurement

Abstract

Abstract PURPOSE:To linearize the relation between the size of the wedge-shaped part of the pattern for measurement and the line width of resist patterns over a wide range of exposing conditions by forming the above-mentioned part to the width change rate smaller toward the front end part. CONSTITUTION:The wedge-shaped pattern TP is formed by determining the curves J1, J2 axisymmetrical with a central axis J parallel with, for example, an (x) axis and continuing the very small rectangular patterns changing in line width at 2.DELTAP each in the direction (y) along the curves J1, J2. The length in the direction (x) of the very small rectangular patterns Pa, Pb is gradually increased toward the front end side of the wedge. Step parts are approximated nearly as smoothly continuous curves by limitation of a projecting optical system and resist when such pattern TP is projected and exposed to a resist layer by using a stepper. The patterns having the edges along the curves J1, J2 are thus formed.

Inventors

• 👤 Shigeru Hirukawa
• 👤 茂 蛭川
• 👤 Kyoichi Suwa
• 👤 恭一 諏訪
• 👤 Hirotaka Tateno
• 👤 立野　博貴

Bibliographic Details