Semiconductor manufacturing device

Abstract

Abstract PURPOSE:To prevent any dust from entering a pre-exhaust chamber by forming a gas curtain at a delivery port of the pre-exhaust chamber. CONSTITUTION:The interior of a pre-exhaust chamber 1 is exhausted as indicated by arrow 7 once a wafer is accommodated, and a valve 4 is opened and the wafer is carried. When the wafer again returns into the exhaust chamber 1 is under atmospheric pressure, a door 3 of a wafer delivery port is opened for carrying in and out the wafer. Upon delivery of the wafer, gas is injected from a gas tube 2 disposed in the exhaust chamber 1 toward the outside as indicated by arrow 6 to form a gas curtain at the wafer delivery port. Thus, any dust is prevented from entering the exhaust chamber 1.

Inventors

• 👤 Noriaki Nishida
• 👤 典明 西田

Bibliographic Details