Magnetron sputtering method

Abstract

Abstract PURPOSE:To extend erosion area, to prolong the service life of a target and to improve uniformity in the thickness of a film by placing three or more magnetically coupled ringlike magnetic poles so as to change a plasma ring from a small diameter to a large diameter and from the large diameter to the small diameter. CONSTITUTION:Three or more ringlike magnetic poles 1, 2, 3 magnetically coupled by a yoke 4 are placed. A plasma ring 10 of a small diameter is formed by applying magnetic flux from the central magnetic pole 1 toward the inner magnetic pole 2. A plasma ring 11 of a medium diameter is formed by applying magnetic flux from the pole 1 toward the pole 2 and from the pole 2 toward the outer magnetic pole 3. A plasma ring 12 of a large diameter is formed by applying magnetic flux from the pole 2 toward the pole 3. When the number (K) of magnetic poles is 3, three kinds of plasma rings are formed according to an equation 2K-3=3 and sputtering is carried out while varying the diameter of a plasma ring.

Inventors

• 👤 Kenichi Kubo
• 👤 久保　謙一

Bibliographic Details