Aligner

Abstract

Abstract PURPOSE:To enhance resolution and to make a pattern to be exposed fine by providing the following so as to be capable of being changed over alternately on a light path: a bandpass filter which transmits light of an exposure wavelength; a filter which does not transmit the light of the exposure wavelength and which transmit light of a wavelength for alignment use. CONSTITUTION:When a workpiece (object to be exposed to light) 5 is aligned with a mask 2 and a B.P.F.(bandpass filter) 19 is situated on a light path, most of light of wavelengths other than an exposure wavelength is removed, light of a wavelength required for an alignment operation is hardly transmitted and the alignment operation cannot be executed. Accordingly, the B.P.F. 19 is withdrawn from the light path by using a driving apparatus 19a; a filter 18 is inserted into the light path instead; an image of a pattern of the mask 2 is formed on the workpiece 5 by using the light of the wavelength required for the alignment operation. Since light of a short wavelength which is sensitive to a resist of a prescribed wavelength or lower is removed by using the filter 18, the alignment operation can be executed effectively without exposing the resist to light. Thereby, resolution of this aligner is enhanced and fine processing of the pattern is possible.

Inventors

• 👤 Osamu Osawa
• 👤 理 大澤

Bibliographic Details