Forming thin e.g. metal layers on mineral substrates - in high speed vacuum chamber from plasma

Abstract

Abstract Thin coatings are applied in a vacuum chamber to a substrate disposed facing an opening in a cavity contained in an enclosure, a gas being injected at predetermined press. into the cavity in which an electromagnetic exciter creates a plasma, as in the parent patent. In the addn. the cavity is maintained at a sufficiently high press. for an arc discharge to strike and be maintained. Used for depositing thin metal refractory metal cpd. or conductive material layers. Appts gives extremely high coating deposition rates.

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