Patent EP1632991A1 successfully refreshed from Google Patents.
EP1632991A1
Expired / Lapsed
EP
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Exposure method, exposure device, and device manufacturing method
Assignee: Nikon Corp
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Filing: 2004-05-24
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Granted: —
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Expires: 2024-05-24
Abstract
Abstract When exposing a substrate by projecting a pattern image onto the substrate via a projection optical system (PL) and liquid (1), an exposure method includes a determination of a liquid immersion condition to be performed to the substrate, such as a liquid type, depending on a film (SP) formed as a liquid contact surface of the substrate. The liquid type is selected by switching between a first liquid supply section (11) and a third liquid supply section (21). It is possible to smoothly perform immersion exposure for the substrate (P) on which a different photo-resist layer is provided.
Inventors
- 👤 Hiroyuki c/o NIKON CORPORATION NAGASAKA
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-31 01:24
CPC Classifications
H; H10; H10P; H10P76/00; H10P76/20; H10P76/204; H10P76/2041; G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70341; G03B; G03B27/00; G03B27/32; G03B27/42; G03F7/20; G03F7/2041; G03F7/70325; G03F7/70691; G03F7/70716; G03F7/70725; G03F7/70775; G03F7/708; G03F7/70858; G03F7/70866
Claims Analysis
Total Claims: 49
Claim 1
Independent Claim
55 words
An exposure method for exposing a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure method comprising: determining a liquid immersion condition for the substrate depending on a film formed as a liquid contact surface of the substrate; and exposing the substrate under the determined liquid immersion condition.
Claim 2
Dependent Claim
24 words
The exposure method according to claim 1, wherein the liquid immersion condition is determined depending on an affinity of the film for the liquid.
Claim 3
Dependent Claim
22 words
The exposure method according to claim 2, wherein the affinity is determined by a contact angle of the liquid with the film.
Claim 4
Dependent Claim
25 words
The exposure method according to claim 1, wherein the liquid immersion condition includes a supply condition for the liquid to be supplied onto the substrate.
Claim 5
Dependent Claim
18 words
The exposure method according to claim 4, wherein the supply condition includes a supply position of the liquid.
Claim 6
Dependent Claim
32 words
The exposure method according to claim 5, wherein a distance at the supply position of the liquid from a projection area of a projection optical system is adjusted depending on the film.
Claim 7
Dependent Claim
19 words
The exposure method according to claim 4, wherein the liquid immersion condition includes a supply amount of the liquid.
Claim 8
Dependent Claim
29 words
The exposure method according to claim 1, wherein the liquid immersion condition includes a recovery condition for the liquid for liquid immersion exposure to be recovered from the substrate.
Claim 9
Dependent Claim
19 words
The exposure method according to claim 8, wherein the liquid immersion condition includes a recovery position of the liquid.
Claim 10
Dependent Claim
32 words
The exposure method according to claim 9, wherein a distance at the recovery position of the liquid from a projection area of a projection optical system is adjusted depending on the film.
Claim 11
Dependent Claim
21 words
The exposure method according to claim 8, wherein the liquid immersion condition includes adjustment of a recovery power for the liquid.
Claim 12
Dependent Claim
24 words
The exposure method according to claim 1, wherein the liquid immersion condition includes a type of the liquid to be supplied onto the substrate.
Claim 13
Dependent Claim
20 words
The exposure method according to claim 2, wherein an exposure condition for the substrate is determined depending on the affinity.
Claim 14
Dependent Claim
21 words
The exposure method according to claim 13, wherein the exposure condition for the substrate includes a movement condition for the substrate.
Claim 15
Dependent Claim
42 words
The exposure method according to claim 13, further comprising moving the substrate in a predetermined scanning direction under a predetermined scanning exposure condition during the exposure, and determining the scanning exposure condition depending on the affinity of the film for the liquid.
Claim 16
Dependent Claim
24 words
The exposure method according to claim 15, wherein a movement velocity of the substrate in the scanning direction is determined depending on the affinity.
Claim 17
Dependent Claim
23 words
The exposure method according to claim 1, wherein the liquid immersion condition is determined in consideration of a movement condition for the substrate.
Claim 18
Dependent Claim
24 words
The exposure method according to claim 1, wherein the exposure is performed in a liquid immersion area formed on a part of the substrate.
Claim 19
Dependent Claim
22 words
The exposure method according to claim 1, wherein the film formed on the substrate is specified before determining the liquid immersion condition.
Claim 20
Dependent Claim
16 words
A method for producing a device, comprising using the exposure method as defined in claim 1.
Claim 21
Dependent Claim
71 words
An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising: a projection optical system which projects the image of the pattern onto the substrate; and a liquid supply mechanism which supplies the liquid, wherein: the liquid supply mechanism changes the liquid to be supplied, depending on a film formed as a liquid contact surface of the substrate.
Claim 22
Dependent Claim
31 words
The exposure apparatus according to claim 21, wherein the liquid supply mechanism has a plurality of piping systems to selectively use a plurality of types of liquids for liquid immersion exposure.
Claim 23
Dependent Claim
24 words
The exposure apparatus according to claim 21, wherein a liquid immersion condition is adjusted depending on the liquid supplied from the liquid supply mechanism.
Claim 24
Dependent Claim
22 words
The exposure apparatus according to claim 21, further comprising a measuring unit which measures an affinity between the liquid and the film.
Claim 25
Dependent Claim
61 words
An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising: a projection optical system which projects the image of the pattern onto the substrate; and a measuring unit which measures an affinity between the liquid and a film formed as a liquid contact surface of the substrate.
Claim 26
Dependent Claim
52 words
The exposure apparatus according to claim 25, further comprising a storage unit which stores a plurality of relationships between the affinity between the liquid and the film and a liquid immersion condition corresponding to the affinity, wherein the liquid immersion condition is selected from the storage unit depending on the measured affinity.
Claim 27
Dependent Claim
87 words
An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising: a projection optical system which projects the image of the pattern onto the substrate; and a storage unit which stores a plurality of relationships between an affinity for the liquid and a liquid immersion condition corresponding to the affinity, wherein the liquid immersion condition is selected from the storage unit depending on a film formed as a liquid contact surface of the substrate.
Claim 28
Dependent Claim
31 words
The exposure apparatus according to claim 26 or 27, wherein the liquid immersion condition includes a supply condition for the liquid for liquid immersion exposure to be supplied onto the substrate.
Claim 29
Dependent Claim
26 words
The exposure apparatus according to claim 28, wherein the supply condition includes at least one of a supply position and a supply amount of the liquid.
Claim 30
Dependent Claim
31 words
The exposure apparatus according to claim 26 or 27, wherein the liquid immersion condition includes a recovery condition for the liquid for liquid immersion exposure to be recovered from the substrate.
Claim 31
Dependent Claim
26 words
The exposure apparatus according to claim 30, wherein the recovery condition includes at least one of a recovery position and a recovery amount of the liquid.
Claim 32
Dependent Claim
35 words
The exposure apparatus according to claim 26 or 27, wherein the liquid immersion condition is adjusted while considering a movement condition of the substrate when a plurality of shot areas on the substrate are exposed.
Claim 33
Dependent Claim
28 words
The exposure apparatus according to claim 24 or 25, wherein an exposure condition for the substrate is determined depending on the affinity between the liquid and the film.
Claim 34
Dependent Claim
32 words
The exposure apparatus according to claim 33, wherein the substrate is subjected to scanning exposure while being moved in a predetermined scanning direction, and the exposure condition includes a scanning exposure condition.
Claim 35
Dependent Claim
23 words
The exposure apparatus according to claim 34, wherein the scanning exposure condition includes a movement velocity of the substrate during the scanning exposure.
Claim 36
Dependent Claim
28 words
The exposure apparatus according to any one of claims 24, 25, and 27, wherein the affinity is determined by a contact angle of the liquid with the film.
Claim 37
Dependent Claim
33 words
The exposure apparatus according claim 26 or 27, further comprising a control unit, wherein the control unit selects the liquid immersion condition from the storage unit depending on the affinity or the film.
Claim 38
Dependent Claim
50 words
The exposure apparatus according claim 25 or 27, further comprising a liquid supply mechanism which supplies the liquid onto the substrate, wherein at least one of a position, an opening area, an opening shape, and a supply direction of a liquid supply port of the liquid supply mechanism is variable.
Claim 39
Dependent Claim
68 words
An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising: a projection optical system which projects the image of the pattern onto the substrate; and a storage unit which stores relationships between a variety of films formable as a liquid contact surface of the substrate and liquid immersion conditions suitable for the respective films.
Claim 40
Dependent Claim
43 words
The exposure apparatus according claim 39, further comprising a control unit which sets a liquid immersion condition by selecting the liquid immersion condition among the liquid immersion conditions from the storage unit depending on a film to be used for liquid immersion exposure.
Claim 41
Dependent Claim
23 words
The exposure apparatus according claim 40, wherein the control unit adjusts the liquid immersion condition depending on a physical property of the liquid.
Claim 42
Dependent Claim
46 words
The exposure apparatus according claim 39, wherein the liquid immersion conditions include at least one of a condition for supplying the liquid onto the substrate, a condition for recovering the liquid from the substrate, and a type of the liquid to be supplied onto the substrate.
Claim 43
Dependent Claim
53 words
The exposure apparatus according claim 42, further comprising a liquid supply mechanism which supplies the liquid onto the substrate, wherein the condition for supplying the liquid includes at least one of a position, an opening area, an opening shape, and a supply direction of a liquid supply port of the liquid supply mechanism.
Claim 44
Dependent Claim
50 words
The exposure apparatus according claim 42, further comprising a liquid recovery mechanism which recovers the liquid from the substrate, wherein the condition for recovering the liquid includes at least one of a position, an opening area, and an opening shape of a liquid recovery port of the liquid recovery mechanism.
Claim 45
Dependent Claim
69 words
The exposure apparatus according claim 40, further comprising a liquid supply mechanism which selectively supplies a plurality of types of liquids onto the substrate, wherein the control unit selects a liquid type from the storage unit depending on a film to be used for liquid immersion exposure, and the control unit controls the liquid supply mechanism so that the liquid supply mechanism supplies the selected liquid onto the substrate.
Claim 46
Dependent Claim
67 words
An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising: a projection optical system which projects the image of the pattern onto-the substrate; and a liquid supply mechanism which has a supply port for supplying the liquid, wherein: at least one of a size and a shape of the supply port is changeable.
Claim 47
Dependent Claim
37 words
The exposure apparatus according claim 46, further comprising a liquid recovery mechanism which has a recovery port for recovering the liquid, wherein at least one of a size and a shape of the recovery port is changeable.
Claim 48
Dependent Claim
68 words
An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising: a projection optical system which projects the image of the pattern onto the substrate; and a liquid recovery mechanism which has a recovery port for recovering the liquid, wherein: at least one of a size and a shape of the recovery port is changeable.
Claim 49
Independent Claim
25 words
A method for producing a device, comprising using the exposure apparatus as defined in any one of claims 21, 25, 27, 39, 46, and 48.
References Cited (Backward Citations)
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