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EP0887433A1 Expired / Lapsed EP ⏱️ 0.0 years remaining

Silicon dioxide deposition by plasma activated evaporation process

Assignee: SABIC Global Technologies BV
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Filing: 1998-06-26
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Granted: —
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Expires: 2018-06-26
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Abstract

Abstract A plasma activated reactive deposition process is used to deposit silicon oxide scratch resistant coatings on various substrates. The process comprises evaporating silicon or silicon oxide into an argon and nitrous oxide plasma which is directed to the surface to be coated

Inventors

  • 👤 Charles Dominic Iacovangelo

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-09 18:43
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/06; C23C14/10; C23C14/22; C23C14/24; C23C14/32

Claims Analysis

Total Claims: 8
Claim 1
Independent Claim 31 words
A method for deposition of an abrasion resistant coating on a polycarbonate substrate by plasma enhanced reactive evaporation of silica in the presence of nitrous oxide introduced into the plasma region.
Claim 2
Dependent Claim 97 words
A method according to claim 1 for coating a plastic substrate with an abrasion resistant metal oxide layer which comprises placing the plastic substrate in a vacuum chamber, forming a vacuum in the chamber, depositing the abrasion resistant layer by plasma enhanced reactive evaporation of an oxide-forming metal or a metal oxide by electron beam evaporation in the vacuum chamber, passing the evaporated metal or metal oxide into an argon plasma containing oxygen and nitrous oxide, exposing the plastic substrate to the plasma whereby the abrasion resistant layer is deposited on the exposed surface of the substrate.
Claim 3
Dependent Claim 19 words
A method according to claim 2 in which the plasma contains oxygen, nitrous oxide, and a reactive organosilicon monomer.
Claim 4
Dependent Claim 22 words
A method according to claim 3 in which the reactive monomer is selected from the group consisting of silanes, siloxanes, and silazanes.
Claim 5
Dependent Claim 19 words
A method according to claim 2, 3 or 4 in which the oxid-forming metal is silicon, titanium, or aluminum
Claim 6
Independent Claim 19 words
A method according to any one of claims 2 to 5 in which the plastic substrate is a polycarbonate.
Claim 7
Independent Claim 22 words
A method according to any one of claims 2 to 6 in which the metal oxide evaporated into the plasma is silica.
Claim 8
Dependent Claim 20 words
A method according to claim 5 in which the organosilicon compound is tetramethyldisiloxane, hexamethyldisiloxane, tetraethyl orthosilicate, hexamethyldisilane, octamethylcyclotetrasiloxane or tetramethylcyclotetrasiloxane.

References Cited (Backward Citations)

US3522080A Cited
US4200681A Cited
US5436035A Cited
DE19548160C1 Cited
DE19612345C1 Cited

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