Patent EP0832918A1 successfully refreshed from Google Patents.
EP0832918A1
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Resin etching solution and etching process
Assignee: Toray Engineering Co Ltd
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Filing: 1997-09-22
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Granted: —
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Expires: 2017-09-22
Abstract
Abstract A resin etching solution comprises a hydroxyalkylamine, an alkali metal compound and water, or an aliphatic alcohol, an aliphatic amine, an alkali metal compound and water, and a process for etching a polyimide film comprises forming a resist pattern or metal layer pattern using the resin etching solution.
Inventors
- 👤 Atsushi Suzuki
- 👤 Mayumi Aimoto
- 👤 Takashi Kubota
- 👤 Masanori Akita
- 👤 Koji Itoh
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-02 12:41
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/20; H10P50/28; H10P50/286; H10P50/287; C; C09; C09K; C09K13/00; C09K13/02; C08; C08J; C08J7/00; C08J7/12; H05; H05K; H05K3/00; H05K3/0011; H05K3/0017; H05K3/002; H05K1/00; H05K1/02; H05K1/03; H05K1/0313; H05K1/032; H05K1/0346; H05K2201/00; H05K2201/01; H05K2201/0137; H05K2201/0154; H05K2203/00; H05K2203/07; H05K2203/0779; H05K2203/0786; H05K2203/0793; Y; Y10; Y10T; Y10T428/00; Y10T428/25; Y10T428/258; Y10T428/31504; Y10T428/31678
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
13 words
A resin etching solution comprising a
hydroxyalkylamine, an alkali metal compound and water.
Claim 2
Dependent Claim
21 words
A resin etching solution according to claim 1,
which further comprises at least one of urea and an
organic polar solvent.
Claim 3
Dependent Claim
27 words
A resin etching solution according to claim 1
or 2, wherein the hydroxyalkylamine is selected from the
group consisting of primary and secondary amines and
mixtures thereof.
Claim 4
Dependent Claim
33 words
A resin etching solution according to any one
of claims 1 - 3, wherein the alkali metal compound is
selected from the group consisting of potassium, sodium
and lithium hydroxides and mixtures thereof.
Claim 5
Dependent Claim
17 words
A resin etching solution comprising an
aliphatic alcohol, an aliphatic amine, an alkali metal
compound and water.
Claim 6
Dependent Claim
21 words
A resin etching solution according to claim 5,
which further comprises at least one of urea and an
organic polar solvent.
Claim 7
Dependent Claim
29 words
A resin etching solution according to claim 5
or 6, wherein the aliphatic alcohol is selected from the
group consisting of monohydric, dihydric and trihydric
alcohols and mixtures thereof.
Claim 8
Dependent Claim
37 words
A resin etching solution according to any one
of claims 5 - 7, wherein the aliphatic amine is selected
from the group consisting of monovalent primary and
secondary amines, divalent primary and secondary amines
and mixtures thereof.
Claim 9
Dependent Claim
33 words
A resin etching solution according to any one
of claims 5 - 9, wherein the alkali metal compound is
selected from the group consisting of potassium, sodium
and lithium hydroxides and mixtures thereof.
Claim 10
Dependent Claim
40 words
A process for etching a polyimide film
comprising etching a polyimide film comprising a resist
pattern or metal layer pattern formed on either or both
sides using a resin etching solution according to any one
of claims 1 - 9.
Claim 11
Dependent Claim
30 words
A process for etching a polyimide film
according to claim 10, wherein the polyimide film is
etched with irradiation of ultrasonic waves while being
immersed in the resin etching solution.
Claim 12
Dependent Claim
27 words
A process for etching a polyimide film
according to claim 10, wherein the polyimide film is
etched by spraying the resin etching solution through a
spray nozzle.
Claim 13
Dependent Claim
34 words
A resin etching solution comprising (1) an aliphatic component,
which aliphatic component comprises at least one aliphatic compound and provides
each of amine and hydroxy groups; (2) an alkali metal compound; and (3) water
Claim 14
Dependent Claim
19 words
Use, for etching a resin, of a solution according to any one of claims
1 to 9 and 13.
References Cited (Backward Citations)
SU863718A1
Cited
JPS6385602A
Cited
SU1680142A1
Cited
JPH03292337A
Cited
JPH0420539A
Cited
JPH07221457A
Cited
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