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Method for depositing amorphous SiNC coatings

Assignee: Dow Silicones Corp
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Filing: 1996-10-30
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Granted: —
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Expires: 2016-10-30
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Abstract

Abstract Amorphous coatings containing silicon, carbon and nitrogen are formed by the chemical vapor deposition of a reactive gas mixture comprising an organosilicon material and a nitrogen source. The process comprises introducing the reactive gas mixture into a deposition chamber containing the substrate to be coated and then inducing reaction to form the coating.

Inventors

  • 👤 Mark Jon Loboda

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-05 15:20
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/22; C23C16/30; C23C16/36

Claims Analysis

Total Claims: 10
Claim 1
Independent Claim 55 words
A method of depositing an amorphous coating containing silicon, carbon and nitrogen on a substrate comprising: introducing a reactive gas mixture comprising an organosilicon material and a source of nitrogen into a deposition chamber containing the substrate; and inducing reaction of the reactive gas mixture to form an amorphous coating containing silicon, carbon and nitrogen.
Claim 2
Dependent Claim 20 words
The method of claim 1 wherein the organosilicon material is selected from the group consisting of methylsilane, dimethylsilane and trimethylsilane.
Claim 3
Dependent Claim 22 words
The method of claim 1 or claim 2 wherein the nitrogen source is selected from the group consisting of nitrogen and ammonia.
Claim 4
Independent Claim 20 words
The method according to any of claims 1 to 3 wherein the reactive gas mixture also comprises a carrier gas.
Claim 5
Independent Claim 29 words
The method according to any claims 1 to 4 wherein the reactive gas mixture is induced to react by exposure to an elevated temperature in the range of 100-1000°C.
Claim 6
Independent Claim 36 words
The method according to any of claims 1 to 4 wherein the reactive gas mixture is induced to react by exposure to a plasma selected from the group consisting of radio frequency energy and microwave energy.
Claim 7
Independent Claim 18 words
The method according to any of claims 1 to 6 in which the substrate comprises an electronic device.
Claim 8
Dependent Claim 13 words
A coated substrate obtainable by a method according to claims 1 to 7.
Claim 9
Independent Claim 39 words
The method of any of claims 1 to 8 wherein the amorphous coating has the formula Si x C y N Z wherein x/(y+z) is in the range of 0.8 to 1.2, y=0.01 to 0.99 and z=0.99 to 0.01.
Claim 10
Dependent Claim 31 words
The amorphous coating of claim 9 having the formula Si x C y N z , wherein x/(y+z) approaches 1, y = 0.01 to 0.99 and z = 0.99 to 0.01.

References Cited (Backward Citations)

US5011706A Cited
US4973526A Cited
EP0540084A1 Cited

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