Patent EP0704552A1 successfully refreshed from Google Patents.
EP0704552A1
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EP
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Plasma processing method and plasma generator
Assignee: Sony Corp
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Filing: 1995-09-25
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Granted: —
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Expires: 2015-09-25
Abstract
Abstract A plasma-processing method used in processes for manufacturing semiconductor devices. During plasma processing, ultraviolet radiation is emitted from a region where a plasma is created. An ultraviolet radiation-blocking means blocks the ultraviolet radiation from impinging on the sample surface to protect it. The blocking means passes particles forming a plasma onto the sample surface. The particles passed through the ultraviolet radiation-blocking plates are implanted into the sample. Alternatively, the processed surface of the sample is etched, or a film is deposited on the processed surface of the sample.
Inventors
- 👤 Pal Dharam c/o Sony Corporation Gosain
- 👤 Uesutootaa c/o Sony Corporation Jiyonasan
- 👤 Setsuo c/o Sony Corporation Usui
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-07 22:41
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/32623; H01J37/32651; H01J37/32798; H01J37/32853; H01J37/32871; C; C23; C23C; C23C16/00; C23C16/44; C23C16/448; C23C16/452
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
77 words
A plasma processing method for generating a plasma inside a chamber to process a sample placed inside the chamber, said method comprising the steps of: forming a plasma region inside said plasma; producing ultraviolet radiation from said plasma region; and guiding particles inside said plasma region onto a surface of said sample to implant the particles into said sample, to etch said surface with the particles, or to deposit said particles as a film on said surface.
Claim 2
Dependent Claim
59 words
A plasma generator for generating a plasma inside a chamber to process a sample placed inside the chamber, said plasma generator comprising: a plasma region formed inside said chamber; and an ultraviolet radiation-blocking means mounted between said plasma region and said sample placed inside said chamber, said ultraviolet radiation-blocking means acting to pass said plasma but block ultraviolet radiation.
Claim 3
Dependent Claim
72 words
The plasma generator of claim 2, wherein said plasma region is formed in a position substantially opposite to a processed surface of said sample, and wherein said ultraviolet radiation-blocking means comprises a plurality of ultraviolet radiation-blocking plates each provided with a plurality of holes, said ultraviolet radiation-blocking plates being spaced a given spacing from each other, the holes of said ultraviolet radiation-blocking plates being located in a staggered relation to each other.
Claim 4
Dependent Claim
60 words
The plasma generator of claim 2, wherein said plasma region is formed in a position substantially opposite to a processed surface of said sample, and wherein said ultraviolet radiation-blocking means comprises a plurality of ultraviolet radiation-blocking plates inclined to said processed surface of said sample, said ultraviolet radiation-blocking plates being laid to overlap each other with a given spacing therebetween.
Claim 5
Dependent Claim
77 words
The plasma generator of claim 2, wherein (A) said plasma region is formed at a side of a processed surface of said sample, (B) said ultraviolet radiation-blocking means is mounted along a side wall of said chamber via said plasma region, and (C) ultraviolet radiation-blocking plates each provided with plural holes are spaced a given spacing from each other such that the holes in the ultraviolet radiation-blocking plates are located in a staggered relation to each other.
Claim 6
Dependent Claim
73 words
The plasma generator of claim 2, wherein (A) said plasma region is formed at a side of a processed surface of said sample, (B) said ultraviolet radiation-blocking means is mounted along a side wall of said chamber via said plasma region, and (C) a plurality of ultraviolet radiation-blocking plates are inclined to the side wall of said chamber and spaced a given spacing from each other along said side wall of said chamber.
References Cited (Backward Citations)
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