Patent EP0596678A2 successfully refreshed from Google Patents.
EP0596678A2
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EP
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Vapor phase deposition of hydrogen silsesquioxane resin in the presence of nitrous oxide
Assignee: Dow Silicones Corp
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Filing: 1993-11-01
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Granted: —
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Expires: 2013-11-01
Abstract
Abstract A method is described herein for depositing a coating containing silicon and oxygen on a substrate. The method comprises introducing a gas comprising hydrogen silsesquioxane into a deposition chamber containing the substrate and a reactive environment comprising nitrous oxide. Reaction of the gas is then induced to form the coating.
Inventors
- 👤 Marie Norton Eckstein
- 👤 David Stephen Ballance
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-06 15:51
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/22; C23C16/30; C23C16/40; C23C16/401
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
44 words
A method of depositing a coating containing silicon and oxygen on a substrate comprising: introducing a gas comprising hydrogen silsesquioxane into a deposition chamber containing the substrate and a reactive environment comprising nitrous oxide; and inducing reaction of the gas to form the coating.
Claim 2
Dependent Claim
29 words
The method of claim 1 wherein the hydrogen silsesquioxane has a fraction in which greater than 75% of the species have a number average molecular weight less than 2000.
Claim 3
Dependent Claim
15 words
The method of claim 1 wherein the hydrogen silsesquioxane is diluted in a carrier gas.
Claim 4
Dependent Claim
42 words
The method of claim 1 wherein the hydrogen silsesquioxane is induced to react by a means selected from chemical vapor deposition, low pressure chemical vapor deposition, subatmospheric chemical vapor deposition, plasma enhanced chemical vapor deposition, electron cyclotron resonance and jet vapor deposition.
Claim 5
Dependent Claim
26 words
The method of claim 1 wherein the hydrogen silsesquioxane is induced to react by a means selected from exposure to an elevated temperature or a plasma.
Claim 6
Dependent Claim
15 words
The method of claim 5 in which the temperature is in the range of 100-1000°C.
Claim 7
Dependent Claim
16 words
The method of claim 5 in which the plasma comprises radio frequency energy or microwave energy.
Claim 8
Dependent Claim
31 words
The method of claim 1 wherein the deposition chamber is maintained at a pressure of less than 101 kPa (1 atmosphere) and a temperature in the range of 100 to 1200°C.
Claim 9
Dependent Claim
47 words
The method of claim 1 additionally comprising applying coatings selected from SiO₂ coatings, SiO₂/modifying ceramic oxide layers, silicon containing coatings, silicon carbon containing coatings, silicon nitrogen containing coatings, silicon nitrogen carbon containing coatings, silicon oxygen nitrogen containing coatings and diamond like carbon coatings over the coated substrate.
References Cited (Backward Citations)
No citation records indexed.
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