Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
63 words
A dummy diffraction mask which is used in a lithography process using an exposure tool, comprising diffraction layers assistantly employed together with a main mask and having a pattern by which an image transferred to a photoresist on a wafer is prevented from being resolved from a view of the image transfer characteristic of the exposure tool and the characteristic of the photoresist.
Claim 2
Dependent Claim
30 words
A dummy diffraction mask according to claim 1, wherein said dummy diffraction layers are formed in single-layered or multi-layered structure and formed integrally with or separately from said main mask.
Claim 3
Dependent Claim
34 words
A dummy diffraction mask according to claim 1, wherein said dummy diffraction layers are made of any one selected from a light shielding film pattern, a transparent film pattern and a quartz substrate-etched pattern.
Claim 4
Dependent Claim
39 words
A dummy diffraction mask according to claim 1, wherein said dummy diffraction layers are made of a mixture of at least two patterns selected from a light shielding film pattern, a transparent film pattern and a quartz substrate-etched pattern.
Claim 5
Dependent Claim
17 words
A dummy diffraction mask according to claim 3, wherein said light shielding film is made of Cr.
Claim 6
Dependent Claim
24 words
A dummy diffraction mask according to claim 1, wherein said pattern forming said dummy diffraction layers is formed into one-or two-dimensional periodic grating pattern.
Claim 7
Dependent Claim
41 words
A dummy diffraction mask according to claim 6, wherein said grating patterns forming the dummy diffraction layers has a period as much as integral number times than that of the repeated pattern of the light shielding film of the main mask.
Claim 8
Dependent Claim
37 words
A dummy diffraction mask according to claim 6, wherein a distance between the dummy diffraction layers and the mask is set to be relatively larger than the period of the repeated patterns of the dummy diffraction layers.
Claim 9
Dependent Claim
33 words
A dummy diffraction mask according to claim 1, wherein said dummy diffraction layers are formed into a pattern of which each of repeated pattern areas of different period is different in direction, respectively.