Chemical amplification resist composition

Claim 2

Use according to claim 1, wherein the aminophenyl group, phenyl group and 9-julolidyl group are optionally substituted with the same or different one to three substituents selected from alkyl having 1 to 6 carbon atoms, alkoxy having 1 to 6 carbon atoms, aryl having 6 to 10 carbon atoms, aralkyl having 7 to 10 carbon atoms, halogen, nitro, hydroxy and amino, and the heterocyclic group containing nitrogen is selected from of indolin-2-ylidene, benz[e]indolin-2-ylidene, 2-benzothiazolinylidene, naphtho[2,1-d]thiazol-2(3H)-ylidene, naphtho[1 ,2-d]thiazol-2(1H)-ylidene, 1,4-dihydroquinolin-4-ylidene, 1 ,2-dihydroquinolin-2-ylidene, 2,3-dihydro-1H-imidazo[4,5-b]quinoxalin-2-ylidene and 2-benzoselenazolinylidene, said heterocyclic group containing nitrogen being optionally substituted with the same or different one to three substituents selected from alkyl having 1 to 6 carbon atoms, alkoxy having 1 to 6 carbon atoms, aryl having 6 to 10 carbon atoms, aralkyl having 7 to 10 carbon atoms, halogen, nitro, hydroxy and amino.

Claim 3

Use according to claim 1, the squarylium compound is selected from

Claim 4

Use according to any of claims 1 to 3, wherein the photochemical acid generator is selected from s-triazine compound substituted with at least one trihalomethyl groups, iron-arene complexes, onium salt, aryldiazonium salt, diazoketones, nitrobenzyl ester, sulfonic acid ester and silanol-aluminium complex.

Claim 5

Use acording to claim 4, wherein the photochemical acid generator is s-triazine compound substituted with at least one trihalomethyl groups.

Claim 6

Use according to claim 5, wherein the s-triazine compound substituted with at least one trihalomethyl groups is selected from 2,4,6-tris(trichloromethyl)-s-triazine, 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine and 2-(4-methoxy-1-naphthalenyl)-4,6-bis(trichloromethyl)-s-triazine

Claim 7

Use according to any of claims 1 to 6, wherein the iron-arene compound is a salt of PF 6 ⊖ of (η 6 -isopropylbenzene) (η 5 -cyclopentadienyl)iron (II).

Claim 8

Use according to any of claims 1 to 7, wherein the onium salt is selected from diaryliodonium salt, triarylsulfonium salt, triarylselenonium salt, dialkylphenacylsulfonium salt, dialkyl-4-hydroxyphenylsulfonium salt and iodonium salt.

Claim 9

Use according to any of claims 1 to 8, wherein the nitrobenzyl ester is 9,10-diethoxyanthracen-2-sulfonic acid-p-nitrobenzyl ester.

Claim 10

Use according to any of claims 1 to 9, wherein the sulfonic acid ester is α-hydroxymethylbenzoinsulfonic acid ester and/or N-hydroxyimidosulfonate.

Claim 11

Use according to any of claims 1 to 10, wherein the binder is a homopolymer or copolymer of monomers selected from acrylic acid or ester thereof, methacrylic acid or ester thereof, (anhydrous) maleic acid or ester thereof, acrylonitrile, styrene, α-alkylstyrene, α-acetoxystyrene, hydroxystyrene, α-alkylhydroxystyrene, a-acetoxyhydroxystyrene, or the substituted compounds obtained by protecting the hydroxy groups of the above compounds with a protecting group easily hydrolyzable by acid treatment, or cyclic analogues thereof, vinyl acetate, vinyl chloride, vinylidene chloride, butadiene, crotonic acid, itaconic acid, N-substituted maleimide, vinyl benzoate, or copolymer of the above esters, polyethylene oxide, polyvinyl pyrrolidone, polyamide, polyurethane, polyethylene terephtalate, acetyl cellulose, methyl cellulose, ethyl cellulose, polyvinyl butyrate, chlorinated polyolefine, polyalkylene, polyaldehyde, polycarbonate, epoxy resin, cresol novolak resin, melamine resin, alkyd resin, modified polyvinyl alcohol, and block or graft copolymer or modified polymer by combination of them.

Claim 12

A chemical amplification resist composition comprising a squarylium compound as defined in any of claims 1 to 6, a photochemical acid generator and a binder, wherein the iron-arene compound is a salt of PF 6 ⊖ of (η 6 -isopropylbenzene) (η 5 -cyclopentadienyl)iron (II).

Claim 13

A chemical amplification resist composition comprising a squarylium compound as defined in any of claims 1 to 6, a photochemical acid generator and a binder, wherein the onium salt is selected from diaryliodonium salt, triarylsulfonium salt, triarylselenonium salt, dialkylphenacylsulfonium salt, dialkyl-4-hydroxyphenylsulfonium salt and iodonium salt.

Claim 14

A chemical amplification resist composition comprising a squarylium compound as defined in any of claims 1 to 6, a photochemical acid generator and a binder, wherein the nitrobenzyl ester is 9,10-diethoxyanthracen-2-sulfonic acid-p-nitrobenzyl ester.

Claim 15

A chemical amplification resist composition comprising a squarylium compound as defined in any of claims 1 to 6, a photochemical acid generator and a binder, wherein the sulfonic acid ester is α-hydroxymethylbenzoinsulfonic acid ester and/or N-hydroxyimidosulfonate.

Claim 16

The chemical amplification resist composition according to any of claims 12 to 15, wherein the binder is a homopolymer or copolymer of monomers selected from acrylic acid or ester thereof, methacrylic acid or ester thereof, (anhydrous) maleic acid or ester thereof, acrylonitrile, styrene, α-alkylstyrene, α-acetoxystyrene, hydroxystyrene, α-alkylhydroxystyrene, α-acetoxyhydroxystyrene, or the substituted compounds obtained by protecting the hydroxy groups of the above compounds with a protecting group easily hydrolyzable by acid treatment, or cyclic analogues thereof, vinyl acetate, vinyl chloride, vinylidene chloride, butadiene, crotonic acid, itaconic acid, N-substituted maleimide, vinyl benzoate, or copolymer of the above esters, polyethylene oxide, polyvinyl pyrrolidone, polyamide, polyurethane, polyethylene terephtalate, acetyl cellulose, methyl cellulose, ethyl cellulose, polyvinyl butyrate, chlorinated polyolefine, polyalkylene, polyaldehyde, polycarbonate, epoxy resin, cresol novolak resin, melamine resin, alkyd resin, modified polyvinyl alcohol, and block or graft copolymer or modified polymer by combination of them.